使用显微光谱法在微小区域内通过绝对反射率进行测量,可进行高精度膜厚度/光学常数分析。
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YINGCHAOLIANSAIXIAZHUXINXI
TEDIAN
头部集成了薄膜厚度测量所需功能
通过显微光谱法测量高精度绝对反射率(多层膜厚度,光学常数)
1点1秒高速测量
显微分光下广范围的光学系统(紫外至近红外)
区域传感器的安全机制
易于分析向导,初学者也能够进行光学常数分析
独立测量头对应各种inline客制化需求
支持各种自定义
OPTM-A1 | OPTM-A2 | OPTM-A3 | |
---|---|---|---|
波長范围 | 230 ~ 800 nm | 360 ~ 1100 nm | 900 ~ 1600 nm |
膜厚范围 | 1nm ~ 35μm | 7nm ~ 49μm | 16nm ~ 92μm |
测定时间 | 1秒 / 1点 | ||
光斑大小 | 10μm (最小约5μm) | ||
感光元件 | CCD | InGaAs | |
光源規格 | 氘灯+卤素灯 | 卤素灯 | |
电源規格 | AC100V±10V 750VA(自动样品台规格) | ||
尺寸 | 555(W) × 537(D) × 568(H) mm (自动样品台规格之主体部分) | ||
重量 | 约 55kg(自动样品台规格之主体部分) |
测量项目:
绝对反射率测量
多层膜解析
光学常数分析(n:折射率,k:消光系数)
测量示例:
SiO2 SiN的膜厚测量
BANDAOTIJINGTIGUANTONGGUOKONGZHIDIANLIUDEDAOTONGZHUANGTAILAIFASONGXINHAO,DANSHIWEILEFANGZHIDIANLIUXIELOUHELINGYIGEJINGTIGUANDEDIANLIULIUGUORENYILUJING,YOUBIYAOGELIJINGTIGUAN,MAIRUJUEYUANMO。 SiO 2(ERYANGHUAGUI)HUOSiN(DANHUAGUI)KEYONGYUJUEYUANMO。 SiO 2YONGZUOJUEYUANMO,ERSiNYONGZUOJUYOUBISiO 2GENGGAODEJIEDIANCHANGSHUDEJUEYUANMO,HUOSHIZUOWEITONGGUOCMPQUCHUSiO 2DEBUBIYAODEZUDANGCENG。ZHIHOUSiNYEBEIQUCHU。 WEILEJUEYUANMODEXINGNENGHEJINGQUEDEGONGYIKONGZHI,YOUBIYAOCELIANGZHEIXIEMOHOUDU。
彩色抗蚀剂(RGB)的薄膜厚度测量[FE - 0003]
YEJINGXIANSHIQIDEJIEGOUTONGCHANGRUYOUTUSUOSHI。 CFZAIYIGEXIANGSUZHONGJUYOURGB,BINGQIETASHIFEICHANGJINGXIDEWEIXIAOTUAN。 ZAICFMOXINGCHENGFANGFAZHONG,ZHULIUSHICAIYONGYINGYONGZAIBOLIDEZHENGGEBIAOMIANSHANGTUFUJIYUYANLIAODECAISEKANGSHIJI,TONGGUOGUANGKEDUIQIJINXINGPUGUANGHEXIANYING,BINGQIEZAIMEIGERGBCHUJINLIUXIATUANHUADEBUFENDEGONGYI。 ZAIZHEIZHONGQINGKUANGXIA,RUGUOCAISEKANGSHIJIDEHOUDUBUHENGDING,JIANGDAOZHITUANBIANXINGHEZUOWEILVSEQIDAOZHIYANSEBIANHUA,YINCIGUANLIMOHOUDUZHIHENZHONGYAO。
硬涂层膜厚度的测量[FE-0004]
JINNIANLAI,SHIYONGJUYOUGEZHONGGONGNENGDEGAOXINGNENGBOMODEYINGCHAOLIANSAIXIAZHUBEIGUANGFANSHIYONG,BINGQIEGENJUYINGYONGBUTONG,HAIXUYAOTIGONGJUYOUZHURUMOCAZULI,KANGCHONGJIXING,NAIREXING,BOMOBIAOMIANDENAIHUAXUEXINGDENGXINGNENGDEBAOHUBOMO。TONGCHANGBAOHUMOCENGSHISHIYONGXINGCHENGDEYINGTUCENG(HC)MO,DANSHIGENJUHCMODEHOUDUBUTONG,KENENGCHUXIANBUQIBAOHUMODEZUOYONG,MOZHONGFASHENGQIAOQU,HUOZHEWAIGUANBUJUNYUNHEBIANXINGDENGBULIANG。 YINCI,GUANLIHCCENGDEMOHOUZHIHENYOUBIYAO。
考虑到表面粗糙度测量的膜厚值[FE-0007]
DANGYANGPINBIAOMIANCUNZAICUCAODU(CUCAODU)SHI,JIANGBIAOMIANCUCAODUHEKONGQI(air)JIMOHOUCAILIAOYI1:1DEBILIHUNHE,MONIWEI“CUCAOCENG”,KEYIFENXICUCAODUHEMOHOUDU。CICHUSHILILECELIANGBIAOMIANCUCAODUWEIJInmDESiN(DANHUAGUI)DEQINGKUANG。
使用超晶格模型测量干涉滤光片[FE-0009]
GANSHELVGUANGPIANSHITONGGUOKONGZHIMOHOUJInkJINXINGCHENGMO,KEYISHIDEZAIZHIDINGBOZHANGDAIYULIJUYOURENYIDEFANSHELVHETOUGUOLV。QIZHONGTEBIESHIGAOJINGDUDEGANSHELVGUANGPIANSHIJIANGGAOZHESHELVCENGHEDIZHESHELVCENGZUHE(YIZU),ZAIJINGGUOSHUCIZHEIYANGDEXUNHUANERCHENGMO。YIXIAJISHULEZHEILEIYANGPINSHIYONGCHAOJINGGEMOXINGCELIANG、FENXIDEANLI。
使用非干涉层模型测量封装的有机EL材料[FE - 0010]
YOUJIELCAILIAOYISHOUYANGQIHESHUIFENDEYINGXIANG,BINGQIEZAIZHENGCHANGDAQITIAOJIANXIATAMENKENENGHUIFASHENGBIANZHIHESUNHUAI。 YINCI,ZAICHENGMOHOUXULIJIYONGBOLIMIFENG。 CICHUZHANSHILEMIFENGZHUANGTAIXIATONGGUOBOLICELIANGMOHOUDUDEQINGKUANG。BOLIHEZHONGJIANKONGQICENGSHIYONGFEIGANSHECENGMOXING。
使用多点相同分析测量未知的超薄nk [FE-0013]
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用界面系数测量基板的薄膜厚度[FE-0015]
RUGUOJIBANBIAOMIANFEIJINGMIANQIECUCAODUDA,ZEYOUYUSANSHE,CELIANGGUANGJIANGDIQIECELIANGDEFANSHELVDIYUSHIJIZHI。ERTONGGUOSHIYONGJIEMIANXISHU,YINWEIKAOLVDAOLEJIBANBIAOMIANSHANGDEFANSHELVDEJIANGDI,KEYICELIANGCHUJIBANSHANGBOMODEMOHOUDUZHI。 ZUOWEISHILI,ZHANSHICELIANGFASICHENGPINLVJIBANSHANGDESHUZHIMODEMOHOUDUDELIZI。
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ZHICHIDINGZHIDEQINGXIE/XUANZHUANPINGTAI,KEDUIYINGGEZHONGXINGZHUANG。KEYICELIANGSHIJIYANGBENDERENYIDUOCHUWEIZHI。
光学干涉膜厚度系统的薄弱点是在不知道材料的光学常数(nk)的情况下,无法进行精确的膜厚度测量,对此大塚电子通过使用独特的分析方法来确认:多点分析。通过同时分析事先准备的厚度不同的样品即可测量。与传统测量方法相比,可以获得极高精度的nk。
通过NIST(美国国家标准与技术研究院)认证的标准样品进行校准,保证了可追溯性。